Modeling CPU Energy Consumption of HPC Applications on the IBM POWER7
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سال
: 2014شناسه الکترونیک: 10.1109/IIT.2014.6939955
کلیدواژه(گان): CMOS integrated circuits,annealing,contact resistance,elemental semiconductors,ion implantation,phosphorus,selenium,silicon,titanium compounds,CMOS performance scaling,NMOS contact resistivity reduction,Se,Si:P,TiSi<,sub>,x<,/sub>,damage engineered selenium implant,implant energy optimization,in-situ epitaxially doped n-SD regions,low specific contact resistivity,millisecond laser annealling,Annealing,Contacts,Implants,Metals,Silicides,Silicon,14nm,CMOS,Contac
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Modeling CPU Energy Consumption of HPC Applications on the IBM POWER7
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date accessioned | 2020-03-12T19:38:43Z | |
date available | 2020-03-12T19:38:43Z | |
date issued | 2014 | |
identifier other | 6787326.pdf | |
identifier uri | https://libsearch.um.ac.ir:443/fum/handle/fum/984730 | |
format | general | |
language | English | |
publisher | IEEE | |
title | Modeling CPU Energy Consumption of HPC Applications on the IBM POWER7 | |
type | Conference Paper | |
contenttype | Metadata Only | |
identifier padid | 8100230 | |
subject keywords | CMOS integrated circuits | |
subject keywords | annealing | |
subject keywords | contact resistance | |
subject keywords | elemental semiconductors | |
subject keywords | ion implantation | |
subject keywords | phosphorus | |
subject keywords | selenium | |
subject keywords | silicon | |
subject keywords | titanium compounds | |
subject keywords | CMOS performance scaling | |
subject keywords | NMOS contact resistivity reduction | |
subject keywords | Se | |
subject keywords | Si:P | |
subject keywords | TiSi< | |
subject keywords | sub> | |
subject keywords | x< | |
subject keywords | /sub> | |
subject keywords | damage engineered selenium implant | |
subject keywords | implant energy optimization | |
subject keywords | in-situ epitaxially doped n-SD regions | |
subject keywords | low specific contact resistivity | |
subject keywords | millisecond laser annealling | |
subject keywords | Annealing | |
subject keywords | Contacts | |
subject keywords | Implants | |
subject keywords | Metals | |
subject keywords | Silicides | |
subject keywords | Silicon | |
subject keywords | 14nm | |
subject keywords | CMOS | |
subject keywords | Contac | |
identifier doi | 10.1109/IIT.2014.6939955 | |
journal title | arallel, Distributed and Network-Based Processing (PDP), 2014 22nd Euromicro International Conferenc | |
filesize | 460574 | |
citations | 0 | |
contributor rawauthor | Gschwandtner, P. , Knobloch, M. , Mohr, B. , Pleiter, D. , Fahringer, T. |