| contributor author | Nelson, Catherine Blackadar | |
| date accessioned | 2020-03-12T22:00:11Z | |
| date available | 2020-03-12T22:00:11Z | |
| date issued | 2014 | |
| identifier other | 6970246.pdf | |
| identifier uri | https://libsearch.um.ac.ir:443/fum/handle/fum/1068015?show=full | |
| format | general | |
| language | English | |
| publisher | IEEE | |
| title | Welcome! | |
| type | Conference Paper | |
| contenttype | Metadata Only | |
| identifier padid | 8202955 | |
| subject keywords | MOSFET | |
| subject keywords | n annealing | |
| subject keywords | n carrier mobility | |
| subject keywords | n gallium | |
| subject keywords | n secondary ion mass spectra | |
| subject keywords | n DIBL | |
| subject keywords | n FinFET leakage characteristics | |
| subject keywords | n Ga | |
| subject keywords | n HS-P mixed halo formation | |
| subject keywords | n SIMS | |
| subject keywords | n SiON | |
| subject keywords | n advanced MOSFET device | |
| subject keywords | n annealing | |
| subject keywords | n carrier mobility degradation | |
| subject keywords | n co-implant | |
| subject keywords | n device gain | |
| subject keywords | n device wafers | |
| subject keywords | n drain induced barrier lowering | |
| subject keywords | n gallium halo | |
| subject keywords | n ground plane-retrograde | |
| subject keywords | n halo profile optimization | |
| subject keywords | n high scattering p-type dopant | |
| subject keywords | n implant induced damage | |
| identifier doi | 10.1109/IWJT.2014.6842053 | |
| journal title | lobal Humanitarian Technology Conference (GHTC), 2014 IEEE | |
| filesize | 187578 | |
| citations | 0 | |
