CMUTs with high-K atomic layer deposition dielectric material insulation layer
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: 2014شناسه الکترونیک: 10.1109/TUFFC.2014.006481
کلیدواژه(گان): atomic layer deposition,capacitive sensors,electric breakdown,hafnium compounds,high-k dielectric thin films,insulating materials,micromachining,microsensors,permittivity,plasma CVD,silicon compounds,ALD materials,CMUT design,HfO<,sub>,2<,/sub>,PECVD,Si<,sub>,x<,/sub>,N<,sub>,y<,/sub>,capacitive micromachined ultrasonic transducers,collapse voltage,dielectric constant,electrical breakdown strength,frequency 16.5 MHz,high-K atomic layer deposition di
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CMUTs with high-K atomic layer deposition dielectric material insulation layer
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| contributor author | Xu, Tao | |
| contributor author | Tekes, Coskun | |
| contributor author | Degertekin, F. | |
| date accessioned | 2020-03-13T00:30:36Z | |
| date available | 2020-03-13T00:30:36Z | |
| date issued | 2014 | |
| identifier issn | 0885-3010 | |
| identifier other | 6968705.pdf | |
| identifier uri | https://libsearch.um.ac.ir:443/fum/handle/fum/1149350?locale-attribute=fa | |
| format | general | |
| language | English | |
| publisher | IEEE | |
| title | CMUTs with high-K atomic layer deposition dielectric material insulation layer | |
| type | Journal Paper | |
| contenttype | Metadata Only | |
| identifier padid | 8332606 | |
| subject keywords | atomic layer deposition | |
| subject keywords | capacitive sensors | |
| subject keywords | electric breakdown | |
| subject keywords | hafnium compounds | |
| subject keywords | high-k dielectric thin films | |
| subject keywords | insulating materials | |
| subject keywords | micromachining | |
| subject keywords | microsensors | |
| subject keywords | permittivity | |
| subject keywords | plasma CVD | |
| subject keywords | silicon compounds | |
| subject keywords | ALD materials | |
| subject keywords | CMUT design | |
| subject keywords | HfO< | |
| subject keywords | sub> | |
| subject keywords | 2< | |
| subject keywords | /sub> | |
| subject keywords | PECVD | |
| subject keywords | Si< | |
| subject keywords | sub> | |
| subject keywords | x< | |
| subject keywords | /sub> | |
| subject keywords | N< | |
| subject keywords | sub> | |
| subject keywords | y< | |
| subject keywords | /sub> | |
| subject keywords | capacitive micromachined ultrasonic transducers | |
| subject keywords | collapse voltage | |
| subject keywords | dielectric constant | |
| subject keywords | electrical breakdown strength | |
| subject keywords | frequency 16.5 MHz | |
| subject keywords | high-K atomic layer deposition di | |
| identifier doi | 10.1109/TUFFC.2014.006481 | |
| journal title | Ultrasonics, Ferroelectrics, and Frequency Control, IEEE Transactions on | |
| journal volume | 61 | |
| journal issue | 12 | |
| filesize | 5163345 | |
| citations | 0 |