Poly Si Nanowire Thin Film Transistors With Vacuum Gap Design
ناشر:
سال
: 2014شناسه الکترونیک: 10.1109/TED.2014.2318706
کلیدواژه(گان): elemental semiconductors,etching,hot carriers,insulators,leakage currents,nanowires,semiconductor device reliability,silicon,thin film transistors,titanium compounds,vacuum microelectronics,Si,TiN,TiN layer,channel spacer surface,channel surface,dc hot-carrier stress,device reliability,electric field,electrical field,embedded vacuum gaps,gate-drain bias,insulator,inversion layer,kink effect,leakage current,offset region,poly Si nanowire,selective etching technique,sh
کالکشن
:
-
آمار بازدید
Poly Si Nanowire Thin Film Transistors With Vacuum Gap Design
Show full item record
contributor author | Tsung-Kuei Kang | |
contributor author | Ysung-Yu Yang | |
contributor author | Feng-Tso Chien | |
date accessioned | 2020-03-13T00:02:33Z | |
date available | 2020-03-13T00:02:33Z | |
date issued | 2014 | |
identifier issn | 0018-9383 | |
identifier other | 6812163.pdf | |
identifier uri | https://libsearch.um.ac.ir:443/fum/handle/fum/1132306 | |
format | general | |
language | English | |
publisher | IEEE | |
title | Poly Si Nanowire Thin Film Transistors With Vacuum Gap Design | |
type | Journal Paper | |
contenttype | Metadata Only | |
identifier padid | 8313260 | |
subject keywords | elemental semiconductors | |
subject keywords | etching | |
subject keywords | hot carriers | |
subject keywords | insulators | |
subject keywords | leakage currents | |
subject keywords | nanowires | |
subject keywords | semiconductor device reliability | |
subject keywords | silicon | |
subject keywords | thin film transistors | |
subject keywords | titanium compounds | |
subject keywords | vacuum microelectronics | |
subject keywords | Si | |
subject keywords | TiN | |
subject keywords | TiN layer | |
subject keywords | channel spacer surface | |
subject keywords | channel surface | |
subject keywords | dc hot-carrier stress | |
subject keywords | device reliability | |
subject keywords | electric field | |
subject keywords | electrical field | |
subject keywords | embedded vacuum gaps | |
subject keywords | gate-drain bias | |
subject keywords | insulator | |
subject keywords | inversion layer | |
subject keywords | kink effect | |
subject keywords | leakage current | |
subject keywords | offset region | |
subject keywords | poly Si nanowire | |
subject keywords | selective etching technique | |
subject keywords | sh | |
identifier doi | 10.1109/TED.2014.2318706 | |
journal title | Electron Devices, IEEE Transactions on | |
journal volume | 61 | |
journal issue | 6 | |
filesize | 2963387 | |
citations | 0 |