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contributor authorJia-Ling Wu
contributor authorHan-Yu Lin
contributor authorPo-Hung Kuo
contributor authorBo-Yuan Su
contributor authorSheng-Yuan Chu
contributor authorYu-Cheng Chen
contributor authorSu-Yin Liu
contributor authorChia-Chiang Chang
contributor authorChin-Jyi Wu
date accessioned2020-03-12T23:59:21Z
date available2020-03-12T23:59:21Z
date issued2014
identifier issn0018-9383
identifier other6802463.pdf
identifier urihttps://libsearch.um.ac.ir:443/fum/handle/fum/1130486?locale-attribute=fa&show=full
formatgeneral
languageEnglish
publisherIEEE
titleEffect of UV-Ozone Treatment on the Performance of ZnO TFTs Fabricated by RF Sputtering Deposition Technique
typeJournal Paper
contenttypeMetadata Only
identifier padid8311017
subject keywordselemental semiconductors
subject keywordsozonation (materials processing)
subject keywordssilicon compounds
subject keywordssputter deposition
subject keywordsthin film transistors
subject keywordszinc compounds
subject keywordsHall measurement results
subject keywordsRF sputtering deposition technique
subject keywordsSi substrates
subject keywordsSiO2 dielectric layer
subject keywordsSiO<
subject keywordssub>
subject keywords2<
subject keywords/sub>
subject keywordsTFT
subject keywordsUV-ozone treatment
subject keywordsZnO
subject keywordsZnO channels
subject keywordsZnO films
subject keywordsadhesion properties
subject keywordsbottom-gate thin-film transistors
subject keywordscrystallization
subject keywordsgallium zinc oxide source-drain electrodes
subject keywordslarge-area flat-panel displays
subject keywordsoxygen vacancies
subject keywordsradiofreque
identifier doi10.1109/TED.2014.2309636
journal titleElectron Devices, IEEE Transactions on
journal volume61
journal issue5
filesize3852696
citations0


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