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Overlay-aware detailed routing for self-aligned double patterning lithography using the cut process

contributor authorIou-Jen Liu , Shao-Yun Fang , Yao-Wen Chang
date accessioned2020-03-12T20:38:54Z
date available2020-03-12T20:38:54Z
date issued2014
identifier other6881377.pdf
identifier urihttps://libsearch.um.ac.ir:443/fum/handle/fum/1020628?show=full
formatgeneral
languageEnglish
publisherIEEE
titleOverlay-aware detailed routing for self-aligned double patterning lithography using the cut process
typeConference Paper
contenttypeMetadata Only
identifier padid8145156
subject keywordsgovernment policies
subject keywordspower system economics
subject keywordsrenewable energy sources
subject keywordsDR system
subject keywordsEMS
subject keywordsESS
subject keywordsKorea
subject keywordsconvergent power system
subject keywordsdemand response system
subject keywordsefficient energy use
subject keywordsenergy management system
subject keywordsenergy storage system
subject keywordsinformation and communication technology
subject keywordspotential business model
subject keywordsrenewable energy industry
subject keywordsrenewable energy policy
subject keywordsrenewable energy source
subject keywordsunstable power supply
subject keywordsAir pollution
subject keywordsGovernment
subject keywordsGreen products
subject keywordsIndustries
subject keywordsInvestment
subject keywordsPower generation
subject keywordsRenewable energy sources
subject keywordsEM
identifier doi10.1109/ICRERA.2014.7016559
journal titleesign Automation Conference (DAC), 2014 51st ACM/EDAC/IEEE
filesize277796
citations0


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