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Impacts of conduction band offset and border traps on V<inf>th</inf> instability of gate recessed normally-off GaN MIS-HEMTs

Author:
Woojin Choi , Hojin Ryu , Namcheol Jeon , Minseong Lee , Neung-Hee Lee , Kwang-Seok Seo , Ho-Young Cha
Publisher:
IEEE
Year
: 2014
DOI: 10.1109/CEIDP.2014.6995781
URI: https://libsearch.um.ac.ir:443/fum/handle/fum/1005085
Keyword(s): Discharges (electric),Electrodes,Electron tubes,Geometry,Partial discharges,Sulfur hexafluoride,Voltage measurement
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    Impacts of conduction band offset and border traps on V&lt;inf&gt;th&lt;/inf&gt; instability of gate recessed normally-off GaN MIS-HEMTs

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date accessioned2020-03-12T20:11:09Z
date available2020-03-12T20:11:09Z
date issued2014
identifier other6856053.pdf
identifier urihttps://libsearch.um.ac.ir:443/fum/handle/fum/1005085
formatgeneral
languageEnglish
publisherIEEE
titleImpacts of conduction band offset and border traps on V<inf>th</inf> instability of gate recessed normally-off GaN MIS-HEMTs
typeConference Paper
contenttypeMetadata Only
identifier padid8126504
subject keywordsDischarges (electric)
subject keywordsElectrodes
subject keywordsElectron tubes
subject keywordsGeometry
subject keywordsPartial discharges
subject keywordsSulfur hexafluoride
subject keywordsVoltage measurement
identifier doi10.1109/CEIDP.2014.6995781
journal titleower Semiconductor Devices &amp; IC&#039;s (ISPSD), 2014 IEEE 26th International Symposium o
filesize1337548
citations0
contributor rawauthorWoojin Choi , Hojin Ryu , Namcheol Jeon , Minseong Lee , Neung-Hee Lee , Kwang-Seok Seo , Ho-Young Cha
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