Scaling of metal gate workfunction variability in nanometer SOI-FinFETs
| date accessioned | 2020-03-12T19:44:45Z | |
| date available | 2020-03-12T19:44:45Z | |
| date issued | 2014 | |
| identifier other | 6813927.pdf | |
| identifier uri | http://libsearch.um.ac.ir:80/fum/handle/fum/988426?show=full | |
| format | general | |
| language | English | |
| publisher | IEEE | |
| title | Scaling of metal gate workfunction variability in nanometer SOI-FinFETs | |
| type | Conference Paper | |
| contenttype | Metadata Only | |
| identifier padid | 8104578 | |
| subject keywords | Computer architecture | |
| subject keywords | Optical fiber networks | |
| subject keywords | Optical switches | |
| subject keywords | Servers | |
| subject keywords | Software | |
| subject keywords | Virtual machine monitors | |
| subject keywords | Virtualization | |
| identifier doi | 10.1109/ECOC.2014.6964148 | |
| journal title | ltimate Integration on Silicon (ULIS), 2014 15th International Conference on | |
| filesize | 316181 | |
| citations | 0 | |
| contributor rawauthor | Indalecio, G. , Seoane, N. , Aldegunde, M. , Kalna, K. , Garcia-Loureiro, A.J. |
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