Scaling of metal gate workfunction variability in nanometer SOI-FinFETs
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سال
: 2014شناسه الکترونیک: 10.1109/ECOC.2014.6964148
کلیدواژه(گان): Computer architecture,Optical fiber networks,Optical switches,Servers,Software,Virtual machine monitors,Virtualization
کالکشن
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آمار بازدید
Scaling of metal gate workfunction variability in nanometer SOI-FinFETs
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date accessioned | 2020-03-12T19:44:45Z | |
date available | 2020-03-12T19:44:45Z | |
date issued | 2014 | |
identifier other | 6813927.pdf | |
identifier uri | http://libsearch.um.ac.ir:80/fum/handle/fum/988426 | |
format | general | |
language | English | |
publisher | IEEE | |
title | Scaling of metal gate workfunction variability in nanometer SOI-FinFETs | |
type | Conference Paper | |
contenttype | Metadata Only | |
identifier padid | 8104578 | |
subject keywords | Computer architecture | |
subject keywords | Optical fiber networks | |
subject keywords | Optical switches | |
subject keywords | Servers | |
subject keywords | Software | |
subject keywords | Virtual machine monitors | |
subject keywords | Virtualization | |
identifier doi | 10.1109/ECOC.2014.6964148 | |
journal title | ltimate Integration on Silicon (ULIS), 2014 15th International Conference on | |
filesize | 316181 | |
citations | 0 | |
contributor rawauthor | Indalecio, G. , Seoane, N. , Aldegunde, M. , Kalna, K. , Garcia-Loureiro, A.J. |