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contributor authorMimatsu, Hayata
contributor authorMizuno, Jun
contributor authorShoji, Shuji
contributor authorKasahara, T.
contributor authorShih, Kailing
contributor authorNomura, Keigo
contributor authorKanehira, Yukio
contributor authorOgashiwa, Toshinori
date accessioned2020-03-13T00:21:14Z
date available2020-03-13T00:21:14Z
date issued2014
identifier issn1750-0443
identifier other6891915.pdf
identifier urihttp://libsearch.um.ac.ir:80/fum/handle/fum/1143566?show=full
formatgeneral
languageEnglish
publisherIET
titleSimultaneous fabrication of a through-glass interconnect via and a bump using dry film resist and submicron gold particles
typeJournal Paper
contenttypeMetadata Only
identifier padid8326193
subject keywordsadhesion
subject keywordselectrical resistivity
subject keywordsgold
subject keywordsintegrated circuit interconnections
subject keywordsintegrated circuit packaging
subject keywordsphotolithography
subject keywordsphotoresists
subject keywordsplatinum
subject keywordsscanning electron microscopy
subject keywordssputter deposition
subject keywordsthin films
subject keywordstitanium
subject keywordsTGV
subject keywordsTi-Pt-Au-SiO<
subject keywordssub>
subject keywords2<
subject keywords/sub>
subject keywordsadhesion
subject keywordsbump bonding
subject keywordsdry film resist
subject keywordsfour-wire ohm method
subject keywordsfractured bumps
subject keywordsglass integrated circuit chips
subject keywordsglass substrate
subject keywordspackaging processes
subject keywordsphotolithography
subject keywordsscanning electron microscopy
subject keywordssintering
subject keywordssputter deposition
subject keywordssubmicr
identifier doi10.1049/mnl.2014.0187
journal titleMicro &amp; Nano Letters, IET
journal volume9
journal issue8
filesize472630
citations0


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