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Reducing breakthrough dislocation toward Si/SiGe heterostructure to improve advanced HKMG SRAM device performance by optimizing fluorine co-implantation

Author:
Chin, Y.L. , Lin, Y.S. , Hu, Y.C. , Chang, M.H. , Yu, T.W. , Chen, W.T. , Yang, C.Y. , Lin, Y.J. , Chien, C.C. , Wu, J.Y.
Publisher:
IEEE
Year
: 2014
DOI: 10.1109/ISETC.2014.7010793
URI: https://libsearch.um.ac.ir:443/fum/handle/fum/996180
Keyword(s): assistive outdoor navigation,blind and visually impaired users,wearable devices
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    Reducing breakthrough dislocation toward Si/SiGe heterostructure to improve advanced HKMG SRAM device performance by optimizing fluorine co-implantation

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date accessioned2020-03-12T19:56:46Z
date available2020-03-12T19:56:46Z
date issued2014
identifier other6842052.pdf
identifier urihttps://libsearch.um.ac.ir:443/fum/handle/fum/996180?locale-attribute=en
formatgeneral
languageEnglish
publisherIEEE
titleReducing breakthrough dislocation toward Si/SiGe heterostructure to improve advanced HKMG SRAM device performance by optimizing fluorine co-implantation
typeConference Paper
contenttypeMetadata Only
identifier padid8115847
subject keywordsassistive outdoor navigation
subject keywordsblind and visually impaired users
subject keywordswearable devices
identifier doi10.1109/ISETC.2014.7010793
journal titleunction Technology (IWJT), 2014 International Workshop on
filesize540105
citations0
contributor rawauthorChin, Y.L. , Lin, Y.S. , Hu, Y.C. , Chang, M.H. , Yu, T.W. , Chen, W.T. , Yang, C.Y. , Lin, Y.J. , Chien, C.C. , Wu, J.Y.
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