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Impact of the channel thickness on the performance of Schottky barrier metal–oxide–semiconductor field-effect transistors

Author:
Knoch, J.
,
Appenzeller, J.
Year
: 2002
DOI: 10.1063/1.1513657
URI: https://libsearch.um.ac.ir:443/fum/handle/fum/1759222
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    Impact of the channel thickness on the performance of Schottky barrier metal–oxide–semiconductor field-effect transistors

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contributor authorKnoch, J.
contributor authorAppenzeller, J.
date accessioned2020-03-14T21:44:09Z
date available2020-03-14T21:44:09Z
date issued2002
identifier otherKosDlhwfNPr2SUftg7LABhfMyvjGHlcjt3AowAkZfVlUtKQSZX.pdf
identifier urihttps://libsearch.um.ac.ir:443/fum/handle/fum/1759222?locale-attribute=en
formatgeneral
languageEnglish
titleImpact of the channel thickness on the performance of Schottky barrier metal–oxide–semiconductor field-effect transistors
typeJournal Paper
contenttypeFulltext
contenttypeFulltext
identifier padid12498519
identifier doi10.1063/1.1513657
coverageAcademic
pages3082-0
journal volume81
journal issue16
filesize691370
citations2
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