contributor author | Mingzhi Wu | |
contributor author | Tianyuan Huang | |
contributor author | Chenggang Jin | |
contributor author | Lanjian Zhuge | |
contributor author | Qin Han | |
contributor author | Xuemei Wu | |
date accessioned | 2020-03-13T00:26:50Z | |
date available | 2020-03-13T00:26:50Z | |
date issued | 2014 | |
identifier issn | 0093-3813 | |
identifier other | 6932447.pdf | |
identifier uri | https://libsearch.um.ac.ir:443/fum/handle/fum/1147081?locale-attribute=fa&show=full | |
format | general | |
language | English | |
publisher | IEEE | |
title | Effect of Multiple Frequency H<sub>2</sub>/Ar Plasma Treatment on the Optical, Electrical, and Structural Properties of AZO Films | |
type | Journal Paper | |
contenttype | Metadata Only | |
identifier padid | 8330006 | |
subject keywords | Hall effect | |
subject keywords | II-VI semiconductors | |
subject keywords | X-ray diffraction | |
subject keywords | aluminium | |
subject keywords | atomic force microscopy | |
subject keywords | infrared spectra | |
subject keywords | plasma materials processing | |
subject keywords | scanning electron microscopy | |
subject keywords | semiconductor growth | |
subject keywords | semiconductor thin films | |
subject keywords | sputter deposition | |
subject keywords | ultraviolet spectra | |
subject keywords | visible spectra | |
subject keywords | wide band gap semiconductors | |
subject keywords | zinc compounds | |
subject keywords | AZO film solar cell | |
subject keywords | Hall effect measurement | |
subject keywords | Si substrate | |
subject keywords | X-ray diffraction | |
subject keywords | ZnO:Al | |
subject keywords | atomic force microscopy | |
subject keywords | capacitively coupled plasma | |
subject keywords | electrical properties | |
subject keywords | hydrogen atom den | |
identifier doi | 10.1109/TPS.2014.2361640 | |
journal title | Plasma Science, IEEE Transactions on | |
journal volume | 42 | |
journal issue | 12 | |
filesize | 1713470 | |
citations | 0 | |