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Effect of Multiple Frequency H<sub>2</sub>/Ar Plasma Treatment on the Optical, Electrical, and Structural Properties of AZO Films

contributor authorMingzhi Wu
contributor authorTianyuan Huang
contributor authorChenggang Jin
contributor authorLanjian Zhuge
contributor authorQin Han
contributor authorXuemei Wu
date accessioned2020-03-13T00:26:50Z
date available2020-03-13T00:26:50Z
date issued2014
identifier issn0093-3813
identifier other6932447.pdf
identifier urihttps://libsearch.um.ac.ir:443/fum/handle/fum/1147081?locale-attribute=fa&show=full
formatgeneral
languageEnglish
publisherIEEE
titleEffect of Multiple Frequency H<sub>2</sub>/Ar Plasma Treatment on the Optical, Electrical, and Structural Properties of AZO Films
typeJournal Paper
contenttypeMetadata Only
identifier padid8330006
subject keywordsHall effect
subject keywordsII-VI semiconductors
subject keywordsX-ray diffraction
subject keywordsaluminium
subject keywordsatomic force microscopy
subject keywordsinfrared spectra
subject keywordsplasma materials processing
subject keywordsscanning electron microscopy
subject keywordssemiconductor growth
subject keywordssemiconductor thin films
subject keywordssputter deposition
subject keywordsultraviolet spectra
subject keywordsvisible spectra
subject keywordswide band gap semiconductors
subject keywordszinc compounds
subject keywordsAZO film solar cell
subject keywordsHall effect measurement
subject keywordsSi substrate
subject keywordsX-ray diffraction
subject keywordsZnO:Al
subject keywordsatomic force microscopy
subject keywordscapacitively coupled plasma
subject keywordselectrical properties
subject keywordshydrogen atom den
identifier doi10.1109/TPS.2014.2361640
journal titlePlasma Science, IEEE Transactions on
journal volume42
journal issue12
filesize1713470
citations0


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