High-Efficiency Grating Couplers Near 1310 nm Fabricated by 248-nm DUV Lithography
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: 2014شناسه الکترونیک: 10.1109/LPT.2014.2329326
کلیدواژه(گان): diffraction gratings,genetic algorithms,integrated optoelectronics,optical fibre couplers,optical fibre fabrication,optical fibre losses,silicon-on-insulator,ultraviolet lithography,DUV lithography,SOI wafer,back-reflection,deep ultraviolet lithography,etch depths,genetic algorithm,high-efficiency grating couplers,low-loss coupling,mode-matching,silicon-on-insulator wafer,single-mode fibers,waveguide,wavelength 248 nm,Couplers,Gratings,Lithography,Optical fiber devices,O
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High-Efficiency Grating Couplers Near 1310 nm Fabricated by 248-nm DUV Lithography
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contributor author | Ruizhi Shi | |
contributor author | Hang Guan | |
contributor author | Novack, Ari | |
contributor author | Streshinsky, Matthew | |
contributor author | Lim, Andy Eu-Jin | |
contributor author | Guo-Qiang Lo | |
contributor author | Baehr-Jones, Tom | |
contributor author | Hochberg, Michael | |
date accessioned | 2020-03-13T00:07:15Z | |
date available | 2020-03-13T00:07:15Z | |
date issued | 2014 | |
identifier issn | 1041-1135 | |
identifier other | 6826543.pdf | |
identifier uri | https://libsearch.um.ac.ir:443/fum/handle/fum/1135121 | |
format | general | |
language | English | |
publisher | IEEE | |
title | High-Efficiency Grating Couplers Near 1310 nm Fabricated by 248-nm DUV Lithography | |
type | Journal Paper | |
contenttype | Metadata Only | |
identifier padid | 8316569 | |
subject keywords | diffraction gratings | |
subject keywords | genetic algorithms | |
subject keywords | integrated optoelectronics | |
subject keywords | optical fibre couplers | |
subject keywords | optical fibre fabrication | |
subject keywords | optical fibre losses | |
subject keywords | silicon-on-insulator | |
subject keywords | ultraviolet lithography | |
subject keywords | DUV lithography | |
subject keywords | SOI wafer | |
subject keywords | back-reflection | |
subject keywords | deep ultraviolet lithography | |
subject keywords | etch depths | |
subject keywords | genetic algorithm | |
subject keywords | high-efficiency grating couplers | |
subject keywords | low-loss coupling | |
subject keywords | mode-matching | |
subject keywords | silicon-on-insulator wafer | |
subject keywords | single-mode fibers | |
subject keywords | waveguide | |
subject keywords | wavelength 248 nm | |
subject keywords | Couplers | |
subject keywords | Gratings | |
subject keywords | Lithography | |
subject keywords | Optical fiber devices | |
subject keywords | O | |
identifier doi | 10.1109/LPT.2014.2329326 | |
journal title | Photonics Technology Letters, IEEE | |
journal volume | 26 | |
journal issue | 15 | |
filesize | 1110286 | |
citations | 0 |