A novel Frequency Selective sounding scheme for TDD LTE-advanced systems
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Year
: 2014DOI: 10.1109/SMELEC.2014.6920792
Keyword(s): Deposition parameter effects,n RF power,n Reactive RF sputtering,n TiO2 thin film
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A novel Frequency Selective sounding scheme for TDD LTE-advanced systems
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| contributor author | Zhao, Shengjie | |
| contributor author | Zhou, Baolong | |
| contributor author | Zhang, Daqiang | |
| date accessioned | 2020-03-12T23:03:34Z | |
| date available | 2020-03-12T23:03:34Z | |
| date issued | 2014 | |
| identifier other | 7036998.pdf | |
| identifier uri | https://libsearch.um.ac.ir:443/fum/handle/fum/1104153?locale-attribute=en | |
| format | general | |
| language | English | |
| publisher | IEEE | |
| title | A novel Frequency Selective sounding scheme for TDD LTE-advanced systems | |
| type | Conference Paper | |
| contenttype | Metadata Only | |
| identifier padid | 8247228 | |
| subject keywords | Deposition parameter effects | |
| subject keywords | n RF power | |
| subject keywords | n Reactive RF sputtering | |
| subject keywords | n TiO2 thin film | |
| identifier doi | 10.1109/SMELEC.2014.6920792 | |
| filesize | 296781 | |
| citations | 0 |