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An analysis of relationship between contact resistance and fracture of oxide film for connector contacts using finite element method

contributor authorKondo, Takaya
contributor authorNakata, Hirohito
contributor authorSekikawa, Junya
contributor authorKubota, Yoshihiro
contributor authorHayakawa, Kunio
contributor authorNakamura, Tamotsu
date accessioned2020-03-12T22:56:37Z
date available2020-03-12T22:56:37Z
date issued2014
identifier other7031025.pdf
identifier urihttps://libsearch.um.ac.ir:443/fum/handle/fum/1099938?locale-attribute=en&show=full
formatgeneral
languageEnglish
publisherIEEE
titleAn analysis of relationship between contact resistance and fracture of oxide film for connector contacts using finite element method
typeConference Paper
contenttypeMetadata Only
identifier padid8241785
subject keywordschannel estimation
subject keywordsn least mean squares methods
subject keywordsn linear systems
subject keywordsn Macchi channel
subject keywordsn blind identification algorithms
subject keywordsn data input channel
subject keywordsn independent and identically distributed
subject keywordsn least mean square algorithm
subject keywordsn linear nonminimum phase systems
subject keywordsn noise environment case
subject keywordsn nonminimum phase channel
subject keywordsn Channel estimation
subject keywordsn Correlation
subject keywordsn Equations
subject keywordsn Least squares approximations
subject keywordsn Noise measurement
subject keywordsn Signal processing algorithms
subject keywordsn Signal to noise ratio
identifier doi10.1109/ICMCS.2014.6911416
journal titlelectrical Contacts (Holm), 2014 IEEE 60th Holm Conference on
filesize979634
citations0


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