date accessioned | 2020-03-12T22:18:20Z | |
date available | 2020-03-12T22:18:20Z | |
date issued | 2014 | |
identifier other | 7002290.pdf | |
identifier uri | https://libsearch.um.ac.ir:443/fum/handle/fum/1078390?locale-attribute=en&show=full | |
format | general | |
language | English | |
publisher | IEEE | |
title | Conference program | |
type | Conference Paper | |
contenttype | Metadata Only | |
identifier padid | 8214683 | |
subject keywords | III-V semiconductors | |
subject keywords | n cathodoluminescence | |
subject keywords | n diffusion | |
subject keywords | n indium compounds | |
subject keywords | n photoluminescence | |
subject keywords | n plasma materials processing | |
subject keywords | n secondary ion mass spectra | |
subject keywords | n semiconductor quantum wells | |
subject keywords | n spectral line shift | |
subject keywords | n sputter etching | |
subject keywords | n Cl diffusion | |
subject keywords | n InP-InAsP | |
subject keywords | n InP-InAsP quantum well structures | |
subject keywords | n InP-based photonic structures | |
subject keywords | n SIMS | |
subject keywords | n blue shift | |
subject keywords | n cathodoIuminescence | |
subject keywords | n chlorine-based gas chemistries | |
subject keywords | n composition profiles | |
subject keywords | n deep reactive ion etching | |
identifier doi | 10.1109/ICIPRM.2014.6880554 | |
journal title | hotonics (ICP), 2014 IEEE 5th International Conference on | |
filesize | 5636245 | |
citations | 0 | |