contributor author | Koopman, Rob | |
contributor author | Wang, Shenghui | |
date accessioned | 2020-03-12T22:00:10Z | |
date available | 2020-03-12T22:00:10Z | |
date issued | 2014 | |
identifier other | 6970236.pdf | |
identifier uri | https://libsearch.um.ac.ir:443/fum/handle/fum/1068006?locale-attribute=en&show=full | |
format | general | |
language | English | |
publisher | IEEE | |
title | Where should I publish? Detecting journal similarity based on what have been published there | |
type | Conference Paper | |
contenttype | Metadata Only | |
identifier padid | 8202946 | |
subject keywords | MOSFET | |
subject keywords | n annealing | |
subject keywords | n doping | |
subject keywords | n plasma materials processing | |
subject keywords | n surface treatment | |
subject keywords | n titanium compounds | |
subject keywords | n work function | |
subject keywords | n FinFET | |
subject keywords | n MOSCAP wafer | |
subject keywords | n PLAD | |
subject keywords | n TiN | |
subject keywords | n blanket metal film stack | |
subject keywords | n multivoltage tuning | |
subject keywords | n p-metal gate work function modulation | |
subject keywords | n planar MOS capacitor wafer | |
subject keywords | n planar device | |
subject keywords | n plasma doping | |
subject keywords | n sidewall doping | |
subject keywords | n silicon trench structure | |
subject keywords | n Doping | |
subject keywords | n Hydrogen | |
subject keywords | n Logic gates | |
subject keywords | n Plasmas | |
subject keywords | n Tin | |
subject keywords | n Tuning | |
identifier doi | 10.1109/IWJT.2014.6842043 | |
journal title | igital Libraries (JCDL), 2014 IEEE/ACM Joint Conference on | |
filesize | 210450 | |
citations | 0 | |