Maintenance Scheduling of Plasma Etching Chamber in Wafer Fabrication for High-Yield Etching Process
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سال
: 2014شناسه الکترونیک: 10.1109/TSM.2014.2304461
کلیدواژه(گان): binomial distribution,maintenance engineering,scheduling,semiconductor technology,sputter etching,chamber contamination,chemical etching process,high yield etching process,inductively coupled plasma etching chamber,maintenance scheduling,negative binomial distribution,particle count,particle per wafer pass test,wafer fabrication,wet clean process,Atmospheric measurements,Etching,Maintenance engineering,Particle measurements,Plasmas,Pollution measurement,Radio frequency,Indu
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Maintenance Scheduling of Plasma Etching Chamber in Wafer Fabrication for High-Yield Etching Process
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| contributor author | Le Minh Duc | |
| contributor author | Cher Ming Tan | |
| contributor author | Ming Luo | |
| contributor author | Leng, Ian Chan Hian | |
| date accessioned | 2020-03-12T18:44:57Z | |
| date available | 2020-03-12T18:44:57Z | |
| date issued | 2014 | |
| identifier issn | 0894-6507 | |
| identifier other | 6731582.pdf | |
| identifier uri | https://libsearch.um.ac.ir:443/fum/handle/fum/968805 | |
| format | general | |
| language | English | |
| publisher | IEEE | |
| title | Maintenance Scheduling of Plasma Etching Chamber in Wafer Fabrication for High-Yield Etching Process | |
| type | Journal Paper | |
| contenttype | Metadata Only | |
| identifier padid | 8002989 | |
| subject keywords | binomial distribution | |
| subject keywords | maintenance engineering | |
| subject keywords | scheduling | |
| subject keywords | semiconductor technology | |
| subject keywords | sputter etching | |
| subject keywords | chamber contamination | |
| subject keywords | chemical etching process | |
| subject keywords | high yield etching process | |
| subject keywords | inductively coupled plasma etching chamber | |
| subject keywords | maintenance scheduling | |
| subject keywords | negative binomial distribution | |
| subject keywords | particle count | |
| subject keywords | particle per wafer pass test | |
| subject keywords | wafer fabrication | |
| subject keywords | wet clean process | |
| subject keywords | Atmospheric measurements | |
| subject keywords | Etching | |
| subject keywords | Maintenance engineering | |
| subject keywords | Particle measurements | |
| subject keywords | Plasmas | |
| subject keywords | Pollution measurement | |
| subject keywords | Radio frequency | |
| subject keywords | Indu | |
| identifier doi | 10.1109/TSM.2014.2304461 | |
| journal title | Semiconductor Manufacturing, IEEE Transactions on | |
| journal volume | 27 | |
| journal issue | 2 | |
| filesize | 6624320 | |
| citations | 0 |