Design Assessments of a Rectangular DC Magnetron Sputter for Extended Target Life and Faster Sputtering
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: 2014شناسه الکترونیک: 10.1109/TMAG.2013.2278836
کلیدواژه(گان): magnetic fields,sputtering,wear,Taguchi method,active compensation magnetizations,argon electrons,design assessments,extended target life,magnetic fields,passive iron annulus,racetrack erosion patterns,rectangular DC magnetron sputter,sputtering,target erosion patterns,vacuum chamber,Argon,Iron,Magnetic domains,Magnetic hysteresis,Sputtering,Substrates,Trajectory,DC magnetron sputter (MS),erosion pattern,magnetic field,operational trajectory
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Design Assessments of a Rectangular DC Magnetron Sputter for Extended Target Life and Faster Sputtering
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contributor author | Cheng-Tsung Liu | |
contributor author | Hsiao-Chun Yeh | |
contributor author | He-Yu Chung | |
contributor author | Chang-Chou Hwang | |
date accessioned | 2020-03-12T18:37:43Z | |
date available | 2020-03-12T18:37:43Z | |
date issued | 2014 | |
identifier issn | 0018-9464 | |
identifier other | 6692979.pdf | |
identifier uri | https://libsearch.um.ac.ir:443/fum/handle/fum/964868 | |
format | general | |
language | English | |
publisher | IEEE | |
title | Design Assessments of a Rectangular DC Magnetron Sputter for Extended Target Life and Faster Sputtering | |
type | Journal Paper | |
contenttype | Metadata Only | |
identifier padid | 7998443 | |
subject keywords | magnetic fields | |
subject keywords | sputtering | |
subject keywords | wear | |
subject keywords | Taguchi method | |
subject keywords | active compensation magnetizations | |
subject keywords | argon electrons | |
subject keywords | design assessments | |
subject keywords | extended target life | |
subject keywords | magnetic fields | |
subject keywords | passive iron annulus | |
subject keywords | racetrack erosion patterns | |
subject keywords | rectangular DC magnetron sputter | |
subject keywords | sputtering | |
subject keywords | target erosion patterns | |
subject keywords | vacuum chamber | |
subject keywords | Argon | |
subject keywords | Iron | |
subject keywords | Magnetic domains | |
subject keywords | Magnetic hysteresis | |
subject keywords | Sputtering | |
subject keywords | Substrates | |
subject keywords | Trajectory | |
subject keywords | DC magnetron sputter (MS) | |
subject keywords | erosion pattern | |
subject keywords | magnetic field | |
subject keywords | operational trajectory | |
identifier doi | 10.1109/TMAG.2013.2278836 | |
journal title | Magnetics, IEEE Transactions on | |
journal volume | 50 | |
journal issue | 1 | |
filesize | 948729 | |
citations | 0 |