A Fuzzy-Matching Model With Grid Reduction for Lithography Hotspot Detection
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Year
: 2014DOI: 10.1109/TCAD.2014.2351273
Keyword(s): electronic engineering computing,fuzzy reasoning,lithography,CPU run time reduction,advanced IC manufacturing,false-alarm count detection,false-alarm count probability,feature vector dimensional size,fuzzy region,fuzzy-matching model,grid reduction technique,layout pattern detection,lithography hotspot detection,lithography optical wavelength,test benchmark set,Accuracy,Encoding,Feature extraction,Layout,Lithography,Pattern matching,Vectors,Design for manufacturability,dim
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A Fuzzy-Matching Model With Grid Reduction for Lithography Hotspot Detection
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| contributor author | Wan-Yu Wen | |
| contributor author | Jin-cheng Li | |
| contributor author | Sheng-Yuan Lin | |
| contributor author | Jing-Yi Chen | |
| contributor author | Shih-Chieh Chang | |
| date accessioned | 2020-03-13T00:26:17Z | |
| date available | 2020-03-13T00:26:17Z | |
| date issued | 2014 | |
| identifier issn | 0278-0070 | |
| identifier other | 6926928.pdf | |
| identifier uri | https://libsearch.um.ac.ir:443/fum/handle/fum/1146741 | |
| format | general | |
| language | English | |
| publisher | IEEE | |
| title | A Fuzzy-Matching Model With Grid Reduction for Lithography Hotspot Detection | |
| type | Journal Paper | |
| contenttype | Metadata Only | |
| identifier padid | 8329609 | |
| subject keywords | electronic engineering computing | |
| subject keywords | fuzzy reasoning | |
| subject keywords | lithography | |
| subject keywords | CPU run time reduction | |
| subject keywords | advanced IC manufacturing | |
| subject keywords | false-alarm count detection | |
| subject keywords | false-alarm count probability | |
| subject keywords | feature vector dimensional size | |
| subject keywords | fuzzy region | |
| subject keywords | fuzzy-matching model | |
| subject keywords | grid reduction technique | |
| subject keywords | layout pattern detection | |
| subject keywords | lithography hotspot detection | |
| subject keywords | lithography optical wavelength | |
| subject keywords | test benchmark set | |
| subject keywords | Accuracy | |
| subject keywords | Encoding | |
| subject keywords | Feature extraction | |
| subject keywords | Layout | |
| subject keywords | Lithography | |
| subject keywords | Pattern matching | |
| subject keywords | Vectors | |
| subject keywords | Design for manufacturability | |
| subject keywords | dim | |
| identifier doi | 10.1109/TCAD.2014.2351273 | |
| journal title | Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on | |
| journal volume | 33 | |
| journal issue | 11 | |
| filesize | 2258799 | |
| citations | 0 |