Influence of Collimation on Alignment Accuracy in Proximity Lithography
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Year
: 2014DOI: 10.1109/JPHOT.2014.2345878
Keyword(s): displacement measurement,error correction,masks,moire fringes,optical collimators,photolithography,alignment accuracy,convergence angle,divergence angle,error correction,grating,incident light,mask,moire&,#x0301,fringe,moire&,#x0301,imaging,optical beam collimation,physical measurement,proximity lithography,relative linear displacement measurement,Accuracy,Adaptive optics,Convergence,Gratings,Lithography,Optical device fabrication,Optical imaging,Collimation,li
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Influence of Collimation on Alignment Accuracy in Proximity Lithography
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| contributor author | Nan Wang | |
| contributor author | Wei Jiang | |
| contributor author | Jiangping Zhu | |
| contributor author | Yan Tang | |
| contributor author | Wei Yan | |
| contributor author | Junmin Tong | |
| contributor author | Song Hu | |
| date accessioned | 2020-03-13T00:17:25Z | |
| date available | 2020-03-13T00:17:25Z | |
| date issued | 2014 | |
| identifier issn | 1943-0655 | |
| identifier other | 6873225.pdf | |
| identifier uri | https://libsearch.um.ac.ir:443/fum/handle/fum/1141252 | |
| format | general | |
| language | English | |
| publisher | IEEE | |
| title | Influence of Collimation on Alignment Accuracy in Proximity Lithography | |
| type | Journal Paper | |
| contenttype | Metadata Only | |
| identifier padid | 8323683 | |
| subject keywords | displacement measurement | |
| subject keywords | error correction | |
| subject keywords | masks | |
| subject keywords | moire fringes | |
| subject keywords | optical collimators | |
| subject keywords | photolithography | |
| subject keywords | alignment accuracy | |
| subject keywords | convergence angle | |
| subject keywords | divergence angle | |
| subject keywords | error correction | |
| subject keywords | grating | |
| subject keywords | incident light | |
| subject keywords | mask | |
| subject keywords | moire& | |
| subject keywords | #x0301 | |
| subject keywords | fringe | |
| subject keywords | moire& | |
| subject keywords | #x0301 | |
| subject keywords | imaging | |
| subject keywords | optical beam collimation | |
| subject keywords | physical measurement | |
| subject keywords | proximity lithography | |
| subject keywords | relative linear displacement measurement | |
| subject keywords | Accuracy | |
| subject keywords | Adaptive optics | |
| subject keywords | Convergence | |
| subject keywords | Gratings | |
| subject keywords | Lithography | |
| subject keywords | Optical device fabrication | |
| subject keywords | Optical imaging | |
| subject keywords | Collimation | |
| subject keywords | li | |
| identifier doi | 10.1109/JPHOT.2014.2345878 | |
| journal title | Photonics Journal, IEEE | |
| journal volume | 6 | |
| journal issue | 4 | |
| filesize | 1087693 | |
| citations | 0 |