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High-Efficiency Grating Couplers Near 1310 nm Fabricated by 248-nm DUV Lithography

contributor authorRuizhi Shi
contributor authorHang Guan
contributor authorNovack, Ari
contributor authorStreshinsky, Matthew
contributor authorLim, Andy Eu-Jin
contributor authorGuo-Qiang Lo
contributor authorBaehr-Jones, Tom
contributor authorHochberg, Michael
date accessioned2020-03-13T00:07:15Z
date available2020-03-13T00:07:15Z
date issued2014
identifier issn1041-1135
identifier other6826543.pdf
identifier urihttps://libsearch.um.ac.ir:443/fum/handle/fum/1135121?locale-attribute=en&show=full
formatgeneral
languageEnglish
publisherIEEE
titleHigh-Efficiency Grating Couplers Near 1310 nm Fabricated by 248-nm DUV Lithography
typeJournal Paper
contenttypeMetadata Only
identifier padid8316569
subject keywordsdiffraction gratings
subject keywordsgenetic algorithms
subject keywordsintegrated optoelectronics
subject keywordsoptical fibre couplers
subject keywordsoptical fibre fabrication
subject keywordsoptical fibre losses
subject keywordssilicon-on-insulator
subject keywordsultraviolet lithography
subject keywordsDUV lithography
subject keywordsSOI wafer
subject keywordsback-reflection
subject keywordsdeep ultraviolet lithography
subject keywordsetch depths
subject keywordsgenetic algorithm
subject keywordshigh-efficiency grating couplers
subject keywordslow-loss coupling
subject keywordsmode-matching
subject keywordssilicon-on-insulator wafer
subject keywordssingle-mode fibers
subject keywordswaveguide
subject keywordswavelength 248 nm
subject keywordsCouplers
subject keywordsGratings
subject keywordsLithography
subject keywordsOptical fiber devices
subject keywordsO
identifier doi10.1109/LPT.2014.2329326
journal titlePhotonics Technology Letters, IEEE
journal volume26
journal issue15
filesize1110286
citations0


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