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Reactive ion etching processes for Nb/Nb<inf>x</inf>Si<inf>1&#x2212;x</inf>/Nb Josephson junction arrays

date accessioned2020-03-12T23:32:53Z
date available2020-03-12T23:32:53Z
date issued2014
identifier other6898287.pdf
identifier urihttps://libsearch.um.ac.ir:443/fum/handle/fum/1115596?show=full
formatgeneral
languageEnglish
publisherIEEE
titleReactive ion etching processes for Nb/Nb<inf>x</inf>Si<inf>1&#x2212;x</inf>/Nb Josephson junction arrays
typeConference Paper
contenttypeMetadata Only
identifier padid8285063
subject keywordsHarmonic analysis
subject keywordsInductance
subject keywordsPower harmonic filters
subject keywordsPower transmission lines
subject keywordsResonant frequency
subject keywordsSynchronization
subject keywordsVoltage control
subject keywordscurrent control
subject keywordsmicrogrids
subject keywordsphase locked loops
subject keywordspower system harmonics
subject keywordspower system interconnection
identifier doi10.1109/ECCE.2014.6953859
journal titlerecision Electromagnetic Measurements (CPEM 2014), 2014 Conference on
filesize1080935
citations0
contributor rawauthorZhong, Yuan , Li, Jinjin , Cao, Wenhui , Liu, Yonggang , Zhong, Qing , Wang, Xueshen


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