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CMP material development for ceria-based applications

contributor authorTseng, R.
contributor authorTsai, D.
contributor authorTung, K.
contributor authorDeGroot, M.W.
contributor authorBainian Qian
contributor authorYoungrae Park
contributor authorBuley, T.W.
date accessioned2020-03-12T22:38:02Z
date available2020-03-12T22:38:02Z
date issued2014
identifier other7017306.pdf
identifier urihttps://libsearch.um.ac.ir:443/fum/handle/fum/1089412?locale-attribute=en&show=full
formatgeneral
languageEnglish
publisherIEEE
titleCMP material development for ceria-based applications
typeConference Paper
contenttypeMetadata Only
identifier padid8227622
subject keywordsUHF amplifiers
subject keywordsn UHF antennas
subject keywordsn UHF filters
subject keywordsn active filters
subject keywordsn band-pass filters
subject keywordsn electromagnetic coupling
subject keywordsn low noise amplifiers
subject keywordsn passive filters
subject keywordsn wireless LAN
subject keywordsn Agilent ADS
subject keywordsn BPF
subject keywordsn EM coupling
subject keywordsn EM radiation
subject keywordsn EM simulations
subject keywordsn LNA
subject keywordsn LPF
subject keywordsn PA die
subject keywordsn PA power supply
subject keywordsn S-parameter performance
subject keywordsn antenna
subject keywordsn chip-last embedded actives
subject keywordsn electromagnetic coupling
subject keywordsn frequency 2.4 GHz
subject keywordsn full wave EM solver HFSS
subject keywordsn full-wave electrom
identifier doi10.1109/ECTC.2014.6897454
journal titlelanarization/CMP Technology (ICPT), 2014 International Conference on
filesize819736
citations0


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