| date accessioned | 2020-03-12T22:33:32Z | |
| date available | 2020-03-12T22:33:32Z | |
| date issued | 2014 | |
| identifier other | 7014648.pdf | |
| identifier uri | https://libsearch.um.ac.ir:443/fum/handle/fum/1086985?show=full | |
| format | general | |
| language | English | |
| publisher | IEEE | |
| title | Organizers | |
| type | Conference Paper | |
| contenttype | Metadata Only | |
| identifier padid | 8224746 | |
| subject keywords | CMOS integrated circuits | |
| subject keywords | n MOSFET | |
| subject keywords | n amorphisation | |
| subject keywords | n contact resistance | |
| subject keywords | n elemental semiconductors | |
| subject keywords | n germanium | |
| subject keywords | n laser beam annealing | |
| subject keywords | n nickel compounds | |
| subject keywords | n CAE techniques | |
| subject keywords | n Ge | |
| subject keywords | n Ge preamorphization implant | |
| subject keywords | n ITRS 2015 HP nFinFET | |
| subject keywords | n NMOS | |
| subject keywords | n NiGe | |
| subject keywords | n PAI | |
| subject keywords | n PMOS | |
| subject keywords | n carrier activation enhancement techniques | |
| subject keywords | n in-situ contact process | |
| subject keywords | n laser anneal | |
| subject keywords | n saturation drive current | |
| subject keywords | n ultra-low NiGe specific contact resistivities | |
| subject keywords | n Annealing | |
| subject keywords | n Comput | |
| identifier doi | 10.1109/VLSIT.2014.6894409 | |
| journal title | eliability, Infocom Technologies and Optimization (ICRITO) (Trends and Future Directions), 2014 3rd | |
| filesize | 205441 | |
| citations | 0 | |