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Organizers

date accessioned2020-03-12T22:33:32Z
date available2020-03-12T22:33:32Z
date issued2014
identifier other7014648.pdf
identifier urihttps://libsearch.um.ac.ir:443/fum/handle/fum/1086985?locale-attribute=fa&show=full
formatgeneral
languageEnglish
publisherIEEE
titleOrganizers
typeConference Paper
contenttypeMetadata Only
identifier padid8224746
subject keywordsCMOS integrated circuits
subject keywordsn MOSFET
subject keywordsn amorphisation
subject keywordsn contact resistance
subject keywordsn elemental semiconductors
subject keywordsn germanium
subject keywordsn laser beam annealing
subject keywordsn nickel compounds
subject keywordsn CAE techniques
subject keywordsn Ge
subject keywordsn Ge preamorphization implant
subject keywordsn ITRS 2015 HP nFinFET
subject keywordsn NMOS
subject keywordsn NiGe
subject keywordsn PAI
subject keywordsn PMOS
subject keywordsn carrier activation enhancement techniques
subject keywordsn in-situ contact process
subject keywordsn laser anneal
subject keywordsn saturation drive current
subject keywordsn ultra-low NiGe specific contact resistivities
subject keywordsn Annealing
subject keywordsn Comput
identifier doi10.1109/VLSIT.2014.6894409
journal titleeliability, Infocom Technologies and Optimization (ICRITO) (Trends and Future Directions), 2014 3rd
filesize205441
citations0


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