| date accessioned | 2020-03-12T22:18:20Z | |
| date available | 2020-03-12T22:18:20Z | |
| date issued | 2014 | |
| identifier other | 7002290.pdf | |
| identifier uri | https://libsearch.um.ac.ir:443/fum/handle/fum/1078390?show=full | |
| format | general | |
| language | English | |
| publisher | IEEE | |
| title | Conference program | |
| type | Conference Paper | |
| contenttype | Metadata Only | |
| identifier padid | 8214683 | |
| subject keywords | III-V semiconductors | |
| subject keywords | n cathodoluminescence | |
| subject keywords | n diffusion | |
| subject keywords | n indium compounds | |
| subject keywords | n photoluminescence | |
| subject keywords | n plasma materials processing | |
| subject keywords | n secondary ion mass spectra | |
| subject keywords | n semiconductor quantum wells | |
| subject keywords | n spectral line shift | |
| subject keywords | n sputter etching | |
| subject keywords | n Cl diffusion | |
| subject keywords | n InP-InAsP | |
| subject keywords | n InP-InAsP quantum well structures | |
| subject keywords | n InP-based photonic structures | |
| subject keywords | n SIMS | |
| subject keywords | n blue shift | |
| subject keywords | n cathodoIuminescence | |
| subject keywords | n chlorine-based gas chemistries | |
| subject keywords | n composition profiles | |
| subject keywords | n deep reactive ion etching | |
| identifier doi | 10.1109/ICIPRM.2014.6880554 | |
| journal title | hotonics (ICP), 2014 IEEE 5th International Conference on | |
| filesize | 5636245 | |
| citations | 0 | |