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Doping mechanism of helium-based plasma

contributor authorFuse, G.
contributor authorKuriyama, M.
contributor authorSugitani, M.
contributor authorTanaka, M.
date accessioned2020-03-12T21:23:24Z
date available2020-03-12T21:23:24Z
date issued2014
identifier other6939957.pdf
identifier urihttps://libsearch.um.ac.ir:443/fum/handle/fum/1047380?locale-attribute=fa&show=full
formatgeneral
languageEnglish
publisherIEEE
titleDoping mechanism of helium-based plasma
typeConference Paper
contenttypeMetadata Only
identifier padid8176508
subject keywordsApproximation methods
subject keywordsBase stations
subject keywordsComputer architecture
subject keywordsMicroprocessors
subject keywordsMobile communication
subject keywordsMobile computing
subject keywordsWireless communication
identifier doi10.1109/GLOCOM.2014.7037523
journal titleon Implantation Technology (IIT), 2014 20th International Conference on
filesize593946
citations0


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