A Study of Patients with Higher Medical Expenses in DRG 124 - A Regional Hospital as Case
Publisher:
Year
: 2014DOI: 10.1109/ICSICT.2014.7021207
Keyword(s): CMOS integrated circuits,MOSFET,SRAM chips,lithography,low-power electronics,CMOS platform technology,CPP,FinFET technology,MWF gate stack,RDF,SNM,SOI substrates,bulk substrates,contacted poly pitch,lithography,metallization pitch,multipatterning technology,multiworkfunction gate stack,optical patterning limits,random dopant fluctuation,self-aligned processes,size 10 nm,size 48 nm,static noise margin,variability degradation,voltage 0.75 V,voltage 140 mV,Abstracts,Logi
Collections
:
-
Statistics
A Study of Patients with Higher Medical Expenses in DRG 124 - A Regional Hospital as Case
Show full item record
| contributor author | Chun-Lieh Chen , Chin-Shu Tsuan , Yaw-Jen Lin | |
| date accessioned | 2020-03-12T20:00:53Z | |
| date available | 2020-03-12T20:00:53Z | |
| date issued | 2014 | |
| identifier other | 6846038.pdf | |
| identifier uri | http://libsearch.um.ac.ir:80/fum/handle/fum/998614?locale-attribute=en | |
| format | general | |
| language | English | |
| publisher | IEEE | |
| title | A Study of Patients with Higher Medical Expenses in DRG 124 - A Regional Hospital as Case | |
| type | Conference Paper | |
| contenttype | Metadata Only | |
| identifier padid | 8118837 | |
| subject keywords | CMOS integrated circuits | |
| subject keywords | MOSFET | |
| subject keywords | SRAM chips | |
| subject keywords | lithography | |
| subject keywords | low-power electronics | |
| subject keywords | CMOS platform technology | |
| subject keywords | CPP | |
| subject keywords | FinFET technology | |
| subject keywords | MWF gate stack | |
| subject keywords | RDF | |
| subject keywords | SNM | |
| subject keywords | SOI substrates | |
| subject keywords | bulk substrates | |
| subject keywords | contacted poly pitch | |
| subject keywords | lithography | |
| subject keywords | metallization pitch | |
| subject keywords | multipatterning technology | |
| subject keywords | multiworkfunction gate stack | |
| subject keywords | optical patterning limits | |
| subject keywords | random dopant fluctuation | |
| subject keywords | self-aligned processes | |
| subject keywords | size 10 nm | |
| subject keywords | size 48 nm | |
| subject keywords | static noise margin | |
| subject keywords | variability degradation | |
| subject keywords | voltage 0.75 V | |
| subject keywords | voltage 140 mV | |
| subject keywords | Abstracts | |
| subject keywords | Logi | |
| identifier doi | 10.1109/ICSICT.2014.7021207 | |
| journal title | omputer, Consumer and Control (IS3C), 2014 International Symposium on | |
| filesize | 190615 | |
| citations | 2 |