Analytical Assessment of Coordinated Overlay D2D Communications
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Year
: 2014DOI: 10.1109/PLASMA.2014.7012610
Keyword(s): dielectric-barrier discharges,electrodes,heat treatment,plasma CVD,zirconium compounds,AP-PECVD,L-shaped electrodes,ZrO<,sub>,2<,/sub>,atmospheric-pressure plasma-enhanced chemical vapor deposition,dielectric barrier discharge,electrical monitoring,gas exhaust,gas flow stream,gas supply,homogeneous plasmas,linear sweeping motion,liquid precursor,material analysis,optical monitoring,particle formation,plasma reactor,process chamber,substrate heating,substrate stage
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Analytical Assessment of Coordinated Overlay D2D Communications
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date accessioned | 2020-03-12T19:57:54Z | |
date available | 2020-03-12T19:57:54Z | |
date issued | 2014 | |
identifier other | 6843075.pdf | |
identifier uri | http://libsearch.um.ac.ir:80/fum/handle/fum/996841?locale-attribute=en | |
format | general | |
language | English | |
publisher | IEEE | |
title | Analytical Assessment of Coordinated Overlay D2D Communications | |
type | Conference Paper | |
contenttype | Metadata Only | |
identifier padid | 8116667 | |
subject keywords | dielectric-barrier discharges | |
subject keywords | electrodes | |
subject keywords | heat treatment | |
subject keywords | plasma CVD | |
subject keywords | zirconium compounds | |
subject keywords | AP-PECVD | |
subject keywords | L-shaped electrodes | |
subject keywords | ZrO< | |
subject keywords | sub> | |
subject keywords | 2< | |
subject keywords | /sub> | |
subject keywords | atmospheric-pressure plasma-enhanced chemical vapor deposition | |
subject keywords | dielectric barrier discharge | |
subject keywords | electrical monitoring | |
subject keywords | gas exhaust | |
subject keywords | gas flow stream | |
subject keywords | gas supply | |
subject keywords | homogeneous plasmas | |
subject keywords | linear sweeping motion | |
subject keywords | liquid precursor | |
subject keywords | material analysis | |
subject keywords | optical monitoring | |
subject keywords | particle formation | |
subject keywords | plasma reactor | |
subject keywords | process chamber | |
subject keywords | substrate heating | |
subject keywords | substrate stage | |
identifier doi | 10.1109/PLASMA.2014.7012610 | |
journal title | uropean Wireless 2014; 20th European Wireless Conference; Proceedings of | |
filesize | 210593 | |
citations | 0 | |
contributor rawauthor | Stefanatos, Stelios , Gotsis, Antonis G. , Alexiou, Angeliki |