Statistical Characterization of BTI-Induced High-k Dielectric Traps in Nanoscale Transistors
سال
: 2013شناسه الکترونیک: 10.1007/978-1-4614-7909-3_3
کالکشن
:
-
آمار بازدید
Statistical Characterization of BTI-Induced High-k Dielectric Traps in Nanoscale Transistors
Show full item record
| contributor author | Tahui Wang | |
| contributor author | Jung-Piao Chiu | |
| contributor author | Yu-Heng Liu | |
| date accessioned | 2020-03-12T06:22:55Z | |
| date available | 2020-03-12T06:22:55Z | |
| date issued | 2013 | |
| identifier other | vu386htmUxjlqYfiZ5qkbFJAtz_1UNC6EZCpS6oITUVXa0JEuh.pdf | |
| identifier uri | http://libsearch.um.ac.ir:80/fum/handle/fum/777682 | |
| format | general | |
| language | English | |
| title | Statistical Characterization of BTI-Induced High-k Dielectric Traps in Nanoscale Transistors | |
| type | Journal Paper | |
| contenttype | Fulltext | |
| contenttype | Fulltext | |
| identifier padid | 6039035 | |
| identifier doi | 10.1007/978-1-4614-7909-3_3 | |
| journal title | Bias Temperature Instability for Devices and Circuits | |
| coverage | Academic | |
| pages | 53-74 | |
| filesize | 2088402 | |
| citations | 1 |