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Influence of La on electronic structure of a-Al2O3 high k-gate from first principles

نویسنده:
محمد حسینی
,
حسین اصغر رهنمای علی آباد
,
احمد کمپانی
,
Mohammad Hosseini
,
Hossein Asghar Rahnamaye Aliabad
,
Ahmad Kompany
سال
: 2005
چکیده: Abstract

The theoretical effects of La on electronic structure of Al2O3 high k-gate have been studied by first principles. The electronic properties of pure -Al2O3 and La aluminates (Al2-xaxO3, x = 0.50) were studied by using the density functional theory. The calculations were performed by the full potential-linearized augmented plane wave (FP-LAPW) method with the generalized gradient approximation (GGA). The calculated electronic structure and charge density yield a band gap of 6.4 eV for pure -Al2O3 (without empirical correction factor) at the  point in the Brillouin zone, fairly close to experimental values. The substitution of La reduces the band gap to 3.6 eV for Al1.5La0.5O3. The calculated density of states (DOS) of -Al2O3 is in good agreement with recent experimental XPS and XES data.
یو آر آی: http://libsearch.um.ac.ir:80/fum/handle/fum/3391042
کلیدواژه(گان): Influence of La on electronic structure of a-Al2O3 high k-gate from first principles
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    Influence of La on electronic structure of a-Al2O3 high k-gate from first principles

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contributor authorمحمد حسینیen
contributor authorحسین اصغر رهنمای علی آبادen
contributor authorاحمد کمپانیen
contributor authorMohammad Hosseinifa
contributor authorHossein Asghar Rahnamaye Aliabadfa
contributor authorAhmad Kompanyfa
date accessioned2020-06-06T14:18:26Z
date available2020-06-06T14:18:26Z
date issued2005
identifier urihttp://libsearch.um.ac.ir:80/fum/handle/fum/3391042?locale-attribute=fa
description abstractAbstract

The theoretical effects of La on electronic structure of Al2O3 high k-gate have been studied by first principles. The electronic properties of pure -Al2O3 and La aluminates (Al2-xaxO3, x = 0.50) were studied by using the density functional theory. The calculations were performed by the full potential-linearized augmented plane wave (FP-LAPW) method with the generalized gradient approximation (GGA). The calculated electronic structure and charge density yield a band gap of 6.4 eV for pure -Al2O3 (without empirical correction factor) at the  point in the Brillouin zone, fairly close to experimental values. The substitution of La reduces the band gap to 3.6 eV for Al1.5La0.5O3. The calculated density of states (DOS) of -Al2O3 is in good agreement with recent experimental XPS and XES data.
en
languageEnglish
titleInfluence of La on electronic structure of a-Al2O3 high k-gate from first principlesen
typeJournal Paper
contenttypeExternal Fulltext
subject keywordsInfluence of La on electronic structure of a-Al2O3 high k-gate from first principlesen
journal titleCeramics Internationalfa
pages671-675
journal volume0
journal issue31
identifier linkhttps://profdoc.um.ac.ir/paper-abstract-103072.html
identifier articleid103072
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