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Selective formation of an ultra-thin pore seal on mesorporous low-k for a copper dual damascene structure

date accessioned2020-03-12T19:51:05Z
date available2020-03-12T19:51:05Z
date issued2014
identifier other6831890.pdf
identifier urihttp://libsearch.um.ac.ir:80/fum/handle/fum/992456?show=full
formatgeneral
languageEnglish
publisherIEEE
titleSelective formation of an ultra-thin pore seal on mesorporous low-k for a copper dual damascene structure
typeConference Paper
contenttypeMetadata Only
identifier padid8111544
subject keywordsBoolean functions
subject keywordsCiphers
subject keywordsEducational institutions
subject keywordsEncryption
subject keywordsProbability distribution
subject keywordsRabbits
subject keywordsAsymptotic Probability Distribution
subject keywordsComponent Boolean Function
subject keywordsSquare Map
subject keywordsSquare Root Map
subject keywordsVectorial Boolean Function
identifier doi10.1109/ISCISC.2014.6994012
journal titlenterconnect Technology Conference / Advanced Metallization Conference (IITC/AMC), 2014 IEEE Internat
filesize285418
citations0
contributor rawauthorKayaba, Y. , Tanaka, H. , Suzuki, T. , Kohmura, K. , Ono, S.S.


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