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Design Assessments of a Rectangular DC Magnetron Sputter for Extended Target Life and Faster Sputtering

contributor authorCheng-Tsung Liu
contributor authorHsiao-Chun Yeh
contributor authorHe-Yu Chung
contributor authorChang-Chou Hwang
date accessioned2020-03-12T18:37:43Z
date available2020-03-12T18:37:43Z
date issued2014
identifier issn0018-9464
identifier other6692979.pdf
identifier urihttp://libsearch.um.ac.ir:80/fum/handle/fum/964868?show=full
formatgeneral
languageEnglish
publisherIEEE
titleDesign Assessments of a Rectangular DC Magnetron Sputter for Extended Target Life and Faster Sputtering
typeJournal Paper
contenttypeMetadata Only
identifier padid7998443
subject keywordsmagnetic fields
subject keywordssputtering
subject keywordswear
subject keywordsTaguchi method
subject keywordsactive compensation magnetizations
subject keywordsargon electrons
subject keywordsdesign assessments
subject keywordsextended target life
subject keywordsmagnetic fields
subject keywordspassive iron annulus
subject keywordsracetrack erosion patterns
subject keywordsrectangular DC magnetron sputter
subject keywordssputtering
subject keywordstarget erosion patterns
subject keywordsvacuum chamber
subject keywordsArgon
subject keywordsIron
subject keywordsMagnetic domains
subject keywordsMagnetic hysteresis
subject keywordsSputtering
subject keywordsSubstrates
subject keywordsTrajectory
subject keywordsDC magnetron sputter (MS)
subject keywordserosion pattern
subject keywordsmagnetic field
subject keywordsoperational trajectory
identifier doi10.1109/TMAG.2013.2278836
journal titleMagnetics, IEEE Transactions on
journal volume50
journal issue1
filesize948729
citations0


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