Effects of SiO<sub>2</sub> hard masks on si nanophotonic waveguide loss for photonic device integration
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: 2014شناسه الکترونیک: 10.1109/LPT.2013.2287276
کلیدواژه(گان): etching,integrated optics,masks,nanophotonics,optical fabrication,optical waveguides,oxidation,plasma CVD,silicon compounds,PECVD,SiO<,sub>,2<,/sub>,etch selectivity,hard masks,line edge roughness,nanophotonic waveguide loss,photonic device integration,plasma-enhanced chemical vapor deposition,propagation loss,resist etch mask,silicon nanowaveguides fabrication,size 650 nm,thermal oxidation,Loss measurement,Optical losses,Optical waveguides,Photonics,Propagatio
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Effects of SiO<sub>2</sub> hard masks on si nanophotonic waveguide loss for photonic device integration
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| contributor author | Ng, Doris Keh Ting | |
| contributor author | Qian Wang | |
| contributor author | Kim-Peng Lim | |
| contributor author | Jing Pu | |
| contributor author | Kun Tang | |
| contributor author | Yicheng Lai | |
| contributor author | Chee-Wei Lee | |
| contributor author | Seng-Tiong Ho | |
| date accessioned | 2020-03-12T18:30:48Z | |
| date available | 2020-03-12T18:30:48Z | |
| date issued | 2014 | |
| identifier issn | 1041-1135 | |
| identifier other | 6646203.pdf | |
| identifier uri | http://libsearch.um.ac.ir:80/fum/handle/fum/961008 | |
| format | general | |
| language | English | |
| publisher | IEEE | |
| title | Effects of SiO<sub>2</sub> hard masks on si nanophotonic waveguide loss for photonic device integration | |
| type | Journal Paper | |
| contenttype | Metadata Only | |
| identifier padid | 7993732 | |
| subject keywords | etching | |
| subject keywords | integrated optics | |
| subject keywords | masks | |
| subject keywords | nanophotonics | |
| subject keywords | optical fabrication | |
| subject keywords | optical waveguides | |
| subject keywords | oxidation | |
| subject keywords | plasma CVD | |
| subject keywords | silicon compounds | |
| subject keywords | PECVD | |
| subject keywords | SiO< | |
| subject keywords | sub> | |
| subject keywords | 2< | |
| subject keywords | /sub> | |
| subject keywords | etch selectivity | |
| subject keywords | hard masks | |
| subject keywords | line edge roughness | |
| subject keywords | nanophotonic waveguide loss | |
| subject keywords | photonic device integration | |
| subject keywords | plasma-enhanced chemical vapor deposition | |
| subject keywords | propagation loss | |
| subject keywords | resist etch mask | |
| subject keywords | silicon nanowaveguides fabrication | |
| subject keywords | size 650 nm | |
| subject keywords | thermal oxidation | |
| subject keywords | Loss measurement | |
| subject keywords | Optical losses | |
| subject keywords | Optical waveguides | |
| subject keywords | Photonics | |
| subject keywords | Propagatio | |
| identifier doi | 10.1109/LPT.2013.2287276 | |
| journal title | Photonics Technology Letters, IEEE | |
| journal volume | 26 | |
| journal issue | 1 | |
| filesize | 1225903 | |
| citations | 0 |