Effect of Multiple Frequency H<sub>2</sub>/Ar Plasma Treatment on the Optical, Electrical, and Structural Properties of AZO Films
Publisher:
Year
: 2014DOI: 10.1109/TPS.2014.2361640
Keyword(s): Hall effect,II-VI semiconductors,X-ray diffraction,aluminium,atomic force microscopy,infrared spectra,plasma materials processing,scanning electron microscopy,semiconductor growth,semiconductor thin films,sputter deposition,ultraviolet spectra,visible spectra,wide band gap semiconductors,zinc compounds,AZO film solar cell,Hall effect measurement,Si substrate,X-ray diffraction,ZnO:Al,atomic force microscopy,capacitively coupled plasma,electrical properties,hydrogen atom den
Collections
:
-
Statistics
Effect of Multiple Frequency H<sub>2</sub>/Ar Plasma Treatment on the Optical, Electrical, and Structural Properties of AZO Films
Show full item record
| contributor author | Mingzhi Wu | |
| contributor author | Tianyuan Huang | |
| contributor author | Chenggang Jin | |
| contributor author | Lanjian Zhuge | |
| contributor author | Qin Han | |
| contributor author | Xuemei Wu | |
| date accessioned | 2020-03-13T00:26:50Z | |
| date available | 2020-03-13T00:26:50Z | |
| date issued | 2014 | |
| identifier issn | 0093-3813 | |
| identifier other | 6932447.pdf | |
| identifier uri | http://libsearch.um.ac.ir:80/fum/handle/fum/1147081?locale-attribute=en | |
| format | general | |
| language | English | |
| publisher | IEEE | |
| title | Effect of Multiple Frequency H<sub>2</sub>/Ar Plasma Treatment on the Optical, Electrical, and Structural Properties of AZO Films | |
| type | Journal Paper | |
| contenttype | Metadata Only | |
| identifier padid | 8330006 | |
| subject keywords | Hall effect | |
| subject keywords | II-VI semiconductors | |
| subject keywords | X-ray diffraction | |
| subject keywords | aluminium | |
| subject keywords | atomic force microscopy | |
| subject keywords | infrared spectra | |
| subject keywords | plasma materials processing | |
| subject keywords | scanning electron microscopy | |
| subject keywords | semiconductor growth | |
| subject keywords | semiconductor thin films | |
| subject keywords | sputter deposition | |
| subject keywords | ultraviolet spectra | |
| subject keywords | visible spectra | |
| subject keywords | wide band gap semiconductors | |
| subject keywords | zinc compounds | |
| subject keywords | AZO film solar cell | |
| subject keywords | Hall effect measurement | |
| subject keywords | Si substrate | |
| subject keywords | X-ray diffraction | |
| subject keywords | ZnO:Al | |
| subject keywords | atomic force microscopy | |
| subject keywords | capacitively coupled plasma | |
| subject keywords | electrical properties | |
| subject keywords | hydrogen atom den | |
| identifier doi | 10.1109/TPS.2014.2361640 | |
| journal title | Plasma Science, IEEE Transactions on | |
| journal volume | 42 | |
| journal issue | 12 | |
| filesize | 1713470 | |
| citations | 0 |