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A Fuzzy-Matching Model With Grid Reduction for Lithography Hotspot Detection

contributor authorWan-Yu Wen
contributor authorJin-cheng Li
contributor authorSheng-Yuan Lin
contributor authorJing-Yi Chen
contributor authorShih-Chieh Chang
date accessioned2020-03-13T00:26:17Z
date available2020-03-13T00:26:17Z
date issued2014
identifier issn0278-0070
identifier other6926928.pdf
identifier urihttp://libsearch.um.ac.ir:80/fum/handle/fum/1146741?show=full
formatgeneral
languageEnglish
publisherIEEE
titleA Fuzzy-Matching Model With Grid Reduction for Lithography Hotspot Detection
typeJournal Paper
contenttypeMetadata Only
identifier padid8329609
subject keywordselectronic engineering computing
subject keywordsfuzzy reasoning
subject keywordslithography
subject keywordsCPU run time reduction
subject keywordsadvanced IC manufacturing
subject keywordsfalse-alarm count detection
subject keywordsfalse-alarm count probability
subject keywordsfeature vector dimensional size
subject keywordsfuzzy region
subject keywordsfuzzy-matching model
subject keywordsgrid reduction technique
subject keywordslayout pattern detection
subject keywordslithography hotspot detection
subject keywordslithography optical wavelength
subject keywordstest benchmark set
subject keywordsAccuracy
subject keywordsEncoding
subject keywordsFeature extraction
subject keywordsLayout
subject keywordsLithography
subject keywordsPattern matching
subject keywordsVectors
subject keywordsDesign for manufacturability
subject keywordsdim
identifier doi10.1109/TCAD.2014.2351273
journal titleComputer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on
journal volume33
journal issue11
filesize2258799
citations0


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