A novel metallic complex reaction etching for transition metal and magnetic material by low-temperature and damage-free neutral beam process for non-volatile MRAM device applications
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Year
: 2014DOI: 10.1109/SMC.2014.6974393
Keyword(s): Conferences,Cybernetics,Demand Response,cement plant,load shift,modeling and simulation
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A novel metallic complex reaction etching for transition metal and magnetic material by low-temperature and damage-free neutral beam process for non-volatile MRAM device applications
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| contributor author | Xun Gu , Kikuchi, Y. , Nozawa, T. , Samukawa, S. | |
| date accessioned | 2020-03-12T23:28:20Z | |
| date available | 2020-03-12T23:28:20Z | |
| date issued | 2014 | |
| identifier other | 6894362.pdf | |
| identifier uri | http://libsearch.um.ac.ir:80/fum/handle/fum/1112904 | |
| format | general | |
| language | English | |
| publisher | IEEE | |
| title | A novel metallic complex reaction etching for transition metal and magnetic material by low-temperature and damage-free neutral beam process for non-volatile MRAM device applications | |
| type | Conference Paper | |
| contenttype | Metadata Only | |
| identifier padid | 8281883 | |
| subject keywords | Conferences | |
| subject keywords | Cybernetics | |
| subject keywords | Demand Response | |
| subject keywords | cement plant | |
| subject keywords | load shift | |
| subject keywords | modeling and simulation | |
| identifier doi | 10.1109/SMC.2014.6974393 | |
| journal title | LSI Technology (VLSI-Technology): Digest of Technical Papers, 2014 Symposium on | |
| filesize | 822156 | |
| citations | 0 |