•  English
    • Persian
    • English
  •   Login
  • Ferdowsi University of Mashhad
  • |
  • Information Center and Central Library
    • Persian
    • English
  • Home
  • Source Types
    • Journal Paper
    • Ebook
    • Conference Paper
    • Standard
    • Protocol
    • Thesis
  • Use Help
View Item 
  •   FUM Digital Library
  • Fum
  • Articles
  • Latin Articles
  • View Item
  •   FUM Digital Library
  • Fum
  • Articles
  • Latin Articles
  • View Item
  • All Fields
  • Title
  • Author
  • Year
  • Publisher
  • Subject
  • Publication Title
  • ISSN
  • DOI
  • ISBN
Advanced Search
JavaScript is disabled for your browser. Some features of this site may not work without it.

Development of the post-chemical mechanical polishing cleaner suppressing galvanic corrosion between copper and the Co barrier metal

Author:
Kusano, T.
,
Shibata, T.
,
Itou, A.
,
Mizutani, F.
Publisher:
IEEE
Year
: 2014
DOI: 10.1109/ECTC.2014.6897411
URI: http://libsearch.um.ac.ir:80/fum/handle/fum/1089367
Keyword(s): Kalman filters,n inertial systems,n magnetic sensors,n matrix algebra,n microsensors,n Kalman Filter,n MEMS based devices,n PCB warpage,n alignment parameters,n attitude and heading reference systems,n augmenting sensors,n body-local level frame transformation matrix,n gyroscopes,n inner inter-axis alignment error,n low-cost inertial sensors,n magnetic sensors,n micro AHRS,n micro electro mechanical systems based devices,n multi-axis MEMS dev
Collections :
  • Latin Articles
  • Show Full MetaData Hide Full MetaData
  • Statistics

    Development of the post-chemical mechanical polishing cleaner suppressing galvanic corrosion between copper and the Co barrier metal

Show full item record

contributor authorKusano, T.
contributor authorShibata, T.
contributor authorItou, A.
contributor authorMizutani, F.
date accessioned2020-03-12T22:37:57Z
date available2020-03-12T22:37:57Z
date issued2014
identifier other7017264.pdf
identifier urihttp://libsearch.um.ac.ir:80/fum/handle/fum/1089367
formatgeneral
languageEnglish
publisherIEEE
titleDevelopment of the post-chemical mechanical polishing cleaner suppressing galvanic corrosion between copper and the Co barrier metal
typeConference Paper
contenttypeMetadata Only
identifier padid8227570
subject keywordsKalman filters
subject keywordsn inertial systems
subject keywordsn magnetic sensors
subject keywordsn matrix algebra
subject keywordsn microsensors
subject keywordsn Kalman Filter
subject keywordsn MEMS based devices
subject keywordsn PCB warpage
subject keywordsn alignment parameters
subject keywordsn attitude and heading reference systems
subject keywordsn augmenting sensors
subject keywordsn body-local level frame transformation matrix
subject keywordsn gyroscopes
subject keywordsn inner inter-axis alignment error
subject keywordsn low-cost inertial sensors
subject keywordsn magnetic sensors
subject keywordsn micro AHRS
subject keywordsn micro electro mechanical systems based devices
subject keywordsn multi-axis MEMS dev
identifier doi10.1109/ECTC.2014.6897411
journal titlelanarization/CMP Technology (ICPT), 2014 International Conference on
filesize126029
citations0
  • About Us
نرم افزار کتابخانه دیجیتال "دی اسپیس" فارسی شده توسط یابش برای کتابخانه های ایرانی | تماس با یابش
DSpace software copyright © 2019-2022  DuraSpace