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Analysis of cochlear implant artifact removal techniques using the continuous wavelet transform

contributor authorSinkiewicz, D.
contributor authorFriesen, L.
contributor authorGhoraani, B.
date accessioned2020-03-12T21:28:55Z
date available2020-03-12T21:28:55Z
date issued2014
identifier other6944867.pdf
identifier urihttp://libsearch.um.ac.ir:80/fum/handle/fum/1050937?show=full
formatgeneral
languageEnglish
publisherIEEE
titleAnalysis of cochlear implant artifact removal techniques using the continuous wavelet transform
typeConference Paper
contenttypeMetadata Only
identifier padid8180883
subject keywordselectron beam lithography
subject keywordsn EBL throughput optimization
subject keywordsn complementary e-beam lithography
subject keywordsn conflict elimination
subject keywordsn e-beam utilization
subject keywordsn matching-based problem
subject keywordsn merge-and-cut technique
subject keywordsn self-aligned double patterning layout decomposition
subject keywordsn Adaptive optics
subject keywordsn Face
subject keywordsn Layout
subject keywordsn Lithography
subject keywordsn Minimization
subject keywordsn Optimization
subject keywordsn Throughput
identifier doi10.1109/ASPDAC.2014.6742880
journal titlengineering in Medicine and Biology Society (EMBC), 2014 36th Annual International Conference of the
filesize2903004
citations0


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