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نمایش تعداد 1-4 از 4
A novel SiC MESFET with recessed P-Buffer layer
channel near the source and thicker channel near the drain in comparison with the Conventional-Recessed Gate (CRG) SiC MESFET. The narrow channel at the source side of the proposed structure, improves maximum DC transconductance, gate-source capacitance...
Investigation of A I GaNIGaN HEMTs with step aluminum mole fraction and doping level in the barrier layer
electric field, breakdown voltage, maximum DC trans-conductance (gm), drain current, gate-source capacitance, cut off frequency and DC output conductance (go) as a function of different source side (Nss) and drain side (Nos) barrier doping levels...
DC and RF characteristics of SiC MESFETs with different channel doping concentrations under the gate
and thicknesses, but with different doping levels. Changes that occur in the breakdown voltage, DC trans-conductance, drain current, gate-source capacitance, cut off frequency, and short channel effect as a function of different source side (NSS) and drain side...
Recessed p-buffer layer SiC MESFET: A novel device for improving DC and RF characteristics
This is the first report of novel structures designated as recessed p-buffer (RPB) silicon carbide (SiC) metal semiconductor field effect transistors (MESFETs). Important parameters suchas gate–source capacitance, short channel effect, DC trans...